AI · SEMICONDUCTOR · FACT CHECK
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Korean semiconductor components maker TCK has filed an amendment to its patent covering silicon carbide (SiC) focus rings used in semiconductor etching equipment, according to patent records, in the course of an ongoing patent dispute with domestic rival DSTechno.
The amendment concerns TCK's patent related to SiC focus rings, components deployed in semiconductor etch processes. Focus rings are used in plasma etching equipment to shape the plasma and protect wafer edges during processing, and SiC versions are prized for their durability in harsh plasma environments.
The correction was made as the dispute with DSTechno proceeds. Both companies supply SiC components, including focus rings and related parts, for semiconductor process equipment.
TCK lists CVD SiC components among its product offerings on its official website, reflecting its position in the market for silicon carbide parts used in semiconductor manufacturing equipment. The company has been involved in patent contention with DSTechno over etching-related SiC focus ring technology.
The scope of the amended claims and the current status of the litigation were not detailed in the available records.
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